01-27
2020year
Sputtering Equipment Suppliers - ThomasNet

Manufacturer of sputtering equipment including vapor deposition systems. Various processes include magnetron sputtering, arc-deposition, low temperature arc vapor deposition (LTAVD) and plasma enhanced chemical vapor deposition (PECVD) coatings. Available with 1,600 lbs. load capacity and 50 degrees C to 300 degrees C coating temperature.

01-27
2020year
Meyer Burger confirmed as leading PV equipment supplier for

Mar 23, 2016 · Meyer Burger confirmed as leading PV equipment supplier for 2015, but what next? but from the PECVD based technology tool set that came through the acquisition a few years ago of Roth and Rau

01-27
2020year
"Mono as well as multi PERC cells will get a significant

trotherm uses its batch-type plasma enhanced chemical vapor deposition (PECVD) equipment platform. Our PECVD equip - ment has already been installed more than 900 times worldwide for the manufacturing of solar cells, so it is well known and well proven in the industry. So far it is mainly used for the deposition

01-27
2020year
Deposition Equipment | New and Used Semiconductor Equipment

Find new and used deposition equipment for sale and auction at LabX. The first place to look for scientific equipment and semiconductor.

01-27
2020year
Equipment - Photonexport

PhotonExport has cultivated strong relationships with major international PVD and PECVD equipment manufacturers in order to source the highest-quality processes worldwide. We are able to supply the best equipment and products for your unique needs using our network of carefully selected manufacturers.

01-27
2020year
Coating/Deposition Manufacturers - Cell Production Equipment

Coating/Deposition Manufacturers - Cell Production Equipment Companies involved in Coating/Deposition machine production, a key piece of equipment for the production of solar cells. 98 Coating/Deposition equipment manufacturers are listed below.

01-27
2020year
ICP-PECVD (Unaxis VLR) - UCSB Nanofab Wiki

This system is configured as an ICP PECVD deposition tool with 1000 W ICP power, 600 W RF substrate power, and 50°C-350°C operation. This chamber has SiH 4, N 2, O 2, and Ar for gas sources. The high density PECVD produces a more dense, higher quality SiO 2 and Si 3 N 4, as compared with conventional PECVD. With the high density plasma

01-27
2020year
Pecvd Equipment, Pecvd Equipment Suppliers and Manufacturers

About 1% of these are other machinery & industry equipment. A wide variety of pecvd equipment options are available to you, There are 841 pecvd equipment suppliers, mainly located in Asia. The top supplying countries or regions are China, South Korea, and Russian Federation, which supply 99%, 1%, and 1% of pecvd equipment respectively.

01-27
2020year
PECVD Systems - CVD Equipment Corporation

CVD Equipment Corporation (NASDAQ:CVV) designs, develops, and manufactures process equipment solutions for R&D and production applications globally.

01-27
2020year
PECVD - Photonexport

Plasma Enhanced Chemical Vapor Deposition (PECVD) allows thin films (coatings) to be deposited at lower temperatures when compared to the standard process of Chemical Vapor Deposition (CVD). PECVD uses the capacitive coupling between two parallel electrodes (a grounded + a RF-energized electrode) to excite reactant gases between the electrodes

01-27
2020year
About Samco Inc - The Semiconductor and Materials Company

Samco is an industry partner of Low Energy Electronic Systems (LEES) Consortium at Singapore-MIT Alliance for Research and Technology (SMART). Our systems (PECVD, RIE and ICP-RIE) are used for state-of-the-art research of III-V and Silicon CMOS process integration for next-generation semiconductor devices.

01-27
2020year
PECVD Furnace - SVCS Process Innovation

The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVpFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVpFUR-RD).

01-27
2020year
SPEC Equipment > Equipment Inventory > Buy Refurbished PECVD

Equipment: Plasma-Therm 790 Dual Chamber PECVD & RIE System Manufacturer: Plasmatherm Description: The 790 platform, offered in both RIE and PECVD configurations, has been field demonstrated to have low maintenance requirements and is easily operated in R&D through high production environments.

01-27
2020year
TYSTAR: PECVD Systems

Custom Designed PECVD. Plasma-Enhanced Chemical Vapor Deposition (PECVD) is a process of depositing thin films with the aid of a plasma. Out of the various plasma generation methods, Tystar PECVD reactor systems use high-density plasma sources such as radiofrequency (RF-PECVD), microwave (MW-PECVD), and electron cyclotron resonance (ECR-PECVD).

01-27
2020year
PVD Products

PVD Products realizes that a standard system may not achieve your desired results. Our fundamental understanding of your process allows us to build custom thin film deposition systems, combinatorial deposition tools, and reel-to-reel deposition equipment for the coated conductor market.

01-27
2020year
PECVD – Nanofabrication Facility

The Oxford PlasmaPro System 100 PECVD is load-locked tool, capable of depositing silicon oxide, silicon nitride, amorphous silicon, and other films (under staff permission). The PECVD has a 600 W 13.56 MHz plasma source and has an electrically heated lower electrode, capable of a maximum temperature of 400 C. Additionally, the system has a 100

01-27
2020year
Sputtering Equipment Suppliers - ThomasNet

Manufacturer of sputtering equipment including vapor deposition systems. Various processes include magnetron sputtering, arc-deposition, low temperature arc vapor deposition (LTAVD) and plasma enhanced chemical vapor deposition (PECVD) coatings. Available with 1,600 lbs. load capacity and 50 degrees C to 300 degrees C coating temperature.

01-27
2020year
PECVD deposition machine - All industrial manufacturers - Videos

The Applied Producer BLOk (barrier low-k) PECVD system produces the industry's leading ultra-low-k copper barrier and etch stop films for damascene interconnect applications. With the Producer's Twin Chamber® architecture,

01-27
2020year
Used Plasma Etchers & PECVD Equipment | Used & Refurbished

ClassOne Equipment is a leading provider of used equipment of used plasma etchers and PECVD equipment. We offer a wide range of used plasma etchers from a number of respected OEMs, including Yield, Oxford, Tepla, Alcatel, and many other brands.

01-27
2020year
Oxford PECVD Left - Carbide

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